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Proximity effect between a topological insulator and a magnetic insulator with large perpendicular anisotropy

机译:拓扑绝缘体与磁场之间的邻近效应   具有大垂直各向异性的绝缘体

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摘要

We report that thin films of a prototype topological insulator,Bi$_{2}$Se$_{3}$, can be epitaxially grown onto the (0001) surface ofBaFe$_{12}$O$_{19}$(BaM), a magnetic insulator with high Curie temperature andlarge perpendicular anisotropy. In the Bi$_2$Se$_3$ thin films grown onnon-magnetic substrates, classic weak antilocalization (WAL) is manifested ascusp-shaped positive magnetoresistance (MR) in perpendicular magnetic fieldsand parabola-shaped positive MR in parallel fields, whereas inBi$_{2}$Se$_{3}$/BaM heterostructures the low field MR is parabola-shaped,which is positive in perpendicular fields and negative in parallel fields. Themagnetic field and temperature dependence of the MR is explained as aconsequence of the suppression of WAL due to strong magnetic interactions atthe Bi$_{2}$Se$_{3}$/BaM interface.
机译:我们报告说,可以将原型拓扑绝缘体Bi $ _ {2} $ Se $ _ {3} $的薄膜外延生长到BaFe $ _ {12} $ O $ _ {19} $的(0001)表面上(BaM),一种居里温度高且垂直各向异性大的磁绝缘体。在非磁性衬底上生长的Bi $ _2 $ Se $ _3 $薄膜中,经典的弱反局部化(WAL)在垂直磁场中表现为尖峰形正磁阻(MR),在平行磁场中表现为抛物线形正MR。 _ {2} $ Se $ _ {3} $ / BaM异质结构,低场MR为抛物线形,在垂直场中为正,在平行场中为负。 MR的磁场和温度依赖性被解释为由于Bi $ _ {2} $ Se $ _ {3} $ / BaM界面的强磁相互作用而导致WAL抑制的结果。

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